Tantalum particles are widely used in the evaporation coating industry, mainly including the following aspects:
1. Film preparation
Tantalum metal particles, as the basic material, can be used to prepare various thin films. During evaporation, tantalum particles are heated to high temperatures,
vaporize and deposit on the substrate to form a thin film. This film has good adhesion and uniformity, and is widely used in display, solar cell and other fields.
2. Resistance material
Evaporating tantalum particles can be used to prepare resistance films. Tantalum particles are combined with other materials to form a composite that can adjust resistance.
This resistance film can be used in electronic components, sensors and other fields.
3. Conductive materials
Tantalum particles can also be used to prepare conductive films. Under specific process conditions, tantalum particles can react with other materials to form conductive layers.
Conductive film is widely used in electronic components, circuit boards and other fields.
Characteristics of tantalum particles
Tantalum particles have the following characteristics:
1. High melting point
Tantalum particles have a very high melting point and can be used under high temperature conditions. This makes tantalum particles an ideal material for applications in high
temperature environments.
2. Corrosion resistance
Tantalum particles have good corrosion resistance and can remain stable in harsh chemical environments. This makes tantalum particles widely used in chemical, medical and
other fields.
3. Excellent electrical conductivity
Tantalum particles have good electrical conductivity and can be used as conductive materials in the field of electronics. Its conductive property is stable and can conduct current
effectively.
Tantalum particles are widely used in the evaporation coating industry, and their high melting point, corrosion resistance and good electrical conductivity make them an ideal
material choice.
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